US Patent Issued to SHIN-ETSU CHEMICAL on March 18 for "Positive resist composition and pattern forming process" (Japanese Inventor)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,253,802, issued on March 18, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Positive resist composition and pattern forming process" was invented by Jun Hatakeyama (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A positive resist composition comprising a base polymer comprising repeat units consisting of a fluorinated carboxylate, fluorinated phenoxide, fluorinated sulfonamide, fluorinated alkoxide, fluorinated 1,3-diketone, fluorinated Beta-keto ester or fluorinated imide anion and a nitrogen-containing cation having a tertiary ester structure exhibits a high sensitivity, high resolution, low edge roughness and small size variatio...