ALEXANDRIA, Va., March 12 -- United States Patent no. 12,247,285, issued on March 11, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).
"Film-forming method and raw material solution" was invented by Takahiro Sakatsume (Takasaki, Japan) and Takenori Watabe (Annaka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A film-forming method in which film-formation is performed by heat-treating a mist of a raw material solution, the method including: dissolving metal gallium in an acidic solution containing at least one of hydrobromic acid and hydroiodic acid to prepare the raw material solution having a concentration of a metal impurity of less than 2%; and atomizing the raw material solution into a mist, a...