ALEXANDRIA, Va., June 19 -- United States Patent no. 12,330,194, issued on June 17, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).
"Cleaning system and cleaning method" was invented by Atsushi Yoshida (Niigata, Japan), Naruhiro Hoshino (Niigata, Japan) and Masahiko Ishida (Niigata, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A cleaning system comprise: a first pipe 20 connected to a reactor 10 used for producing polysilicon by using chlorosilane as a raw material; a heat exchanger 30 connected to the first pipe 20; a second pipe 60 provided between the heat exchanger 30 and the first pipe 20; and a driving unit 50 provided at the first pipe 20 or the second pipe 60. A cleaning liquid circulate...