ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,209,309, issued on Jan. 28, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).
"Film forming method" was invented by Takenori Watabe (Annaka, Japan) and Hiroshi Hashigami (Annaka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A film forming method for forming a film by heating a mist in a film-forming unit, the method including steps of: atomizing a raw-material solution in an atomizer to generate a mist; conveying the mist with a carrier gas from the atomizer to the film-forming unit through a conveyor that connects the atomizer and the film-forming unit; and heating the mist to form a film on a substrate in the film-forming unit. In this meth...