US Patent Issued to SHIN-ETSU CHEMICAL on Jan. 27 for "Molecular resist composition and patterning process" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,535,733, issued on Jan. 27, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Molecular resist composition and patterning process" was invented by Masahiro Fukushima (Joetsu, Japan), Shun Kikuchi (Joetsu, Japan), Masaki Ohashi (Joetsu, Japan) and Kazuhiro Katayama (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A molecular resist composition comprising a sulfonium salt having formula (1) or (2) and an organic solvent has a high sensitivity and forms a resist film with improved resolution and LWR, when processed by EB or EUV lithography."

The patent was filed on Nov. 1, 2022, under Application No. 17/978,481.

*For further information,...