ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,523,932, issued on Jan. 13, was assigned to Shin-Etsu Chemical Co. Ltd. (Tokyo).
"Resist composition and pattern forming process" was invented by Jun Hatakeyama (Joetsu, Japan) and Masaki Ohashi (Joetsu, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition comprising a sulfonium salt of a carboxylic acid having a nitro-substituted benzene ring is provided. The carboxylic acid is free of iodine and bromine, and when the benzene ring is fluorinated, the number of fluorine atoms is up to 3. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone."
The pat...