US Patent Issued to Shin-Etsu Chemical on Feb. 3 for "Pellicle frame, pellicle, method for inspecting pellicle, pellicle-attached exposure original plate and exposure method, and method for manufacturing semiconductor or liquid crystal display board" (Japanese Inventor)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,541,146, issued on Feb. 3, was assigned to Shin-Etsu Chemical Co. Ltd. (Tokyo).

"Pellicle frame, pellicle, method for inspecting pellicle, pellicle-attached exposure original plate and exposure method, and method for manufacturing semiconductor or liquid crystal display board" was invented by Yu Yanase (Annaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a pellicle frame, a pellicle, a method for inspecting a pellicle, a pellicle-attached exposure original plate and exposure method, and a method for manufacturing a semiconductor or a liquid crystal display board."

The patent was filed on Jan. 15, 2021, under Application No. 17/793,...