US Patent Issued to SHIN-ETSU CHEMICAL on Feb. 18 for "Fluoropolyether group-containing polymer and production method therefor" (Japanese Inventor)

ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,227,616, issued on Feb. 18, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Fluoropolyether group-containing polymer and production method therefor" was invented by Ryusuke Sakoh (Annaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is capable of producing a fluoropolyether group-containing polymer, which is represented by general formula (1) (in the formula, Rf is a monovalent or divalent fluoropolyether group-containing polymer residue, X is independently a divalent organic group, and Alpha is 1 or 2), preferably has a number-average molecular weight of 1,000 to 50,000 in terms of polystyrene, and has both a termina...