US Patent Issued to SHIN-ETSU CHEMICAL on Feb. 10 for "Photocurable fluoropolyether-based elastomer composition and bonding method thereof" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,545,761, issued on Feb. 10, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Photocurable fluoropolyether-based elastomer composition and bonding method thereof" was invented by Hiroyuki Yasuda (Annaka, Japan), Mitsuo Muto (Annaka, Japan) and Kenichi Fukuda (Annaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a photocurable fluoropolyether-based elastomer composition having both a favorable preservation stability and fast curability, being bondable at a low temperature in a short period of time, and generating no air bubbles in the resin at the time of curing; and a bonding method thereof. The photocurable fluoropolyether-base...