US Patent Issued to SHIN-ETSU CHEMICAL on Dec. 9 for "Photosensitive resin composition, photosensitive dry film, and pattern formation method" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,244, issued on Dec. 9, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Photosensitive resin composition, photosensitive dry film, and pattern formation method" was invented by Yoshinori Hirano (Annaka, Japan), Satoshi Asai (Annaka, Japan) and Takahiro Goi (Annaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a photosensitive resin composition which comprises (A) a polymer comprising repeating units represented by formula (A1) and at least one kind of repeating units selected from among repeating units represented by formula (A2) and repeating units represented by formula (A3), (B) an epoxy compound containing four or more ep...