ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,498,637, issued on Dec. 16, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).
"Positive resist composition and pattern forming process" was invented by Jun Hatakeyama (Joetsu, Japan) and Masahiro Fukushima (Joetsu, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A positive resist composition is provided comprising a base polymer comprising repeat units (a) having two triple bonds and repeat units (b) adapted to increase solubility in an alkaline developer under the action of acid. A pattern of good profile with a high resolution, reduced LWR, and improved CDU is formed therefrom."
The patent was filed on Oct. 4, 2022, under Application No. 17/9...