US Patent Issued to SHIN-ETSU CHEMICAL on Aug. 5 for "Material for forming organic film, patterning process, compound, and polymer" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,379,662, issued on Aug. 5, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Material for forming organic film, patterning process, compound, and polymer" was invented by Daisuke Kori (Joetsu, Japan), Seiichiro Tachibana (Joetsu, Japan) and Shiori Nonaka (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A material for forming organic film contains (A) compound shown by general formula (1) and/or polymer having repeating unit shown by general formula (4), and (B) organic solvent. In formula (1), AR1, AR2, AR3, AR4, AR5, and AR6 each represent benzene ring or naphthalene ring; R1 represents any group shown in following formula (2); "n" repr...