US Patent Issued to SHIN-ETSU CHEMICAL on Aug. 19 for "(Poly)thiophene-(poly)siloxane block copolymer and production method thereof" (Japanese Inventor)

ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,391,804, issued on Aug. 19, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"(Poly)thiophene-(poly)siloxane block copolymer and production method thereof" was invented by Shoji Fujita (Annaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a (poly)thiophene-(poly)siloxane block copolymer and a production method of a (poly)arylene-(poly)siloxane block copolymer, where the production method is capable of employing raw materials that are readily accessible, produces no metal salt as a by-product, and brings about a high conversion rate. The (poly)thiophene-(poly)siloxane block copolymer contains a structure represented by the follow...