US Patent Issued to SHIN-ETSU CHEMICAL on April 8 for "Negative resist composition and pattern forming process" (Japanese Inventors)

ALEXANDRIA, Va., April 9 -- United States Patent no. 12,271,112, issued on April 8, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Negative resist composition and pattern forming process" was invented by Jun Hatakeyama (Joetsu, Japan), Naoya Inoue (Joetsu, Japan) and Kenji Funatsu (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A negative resist composition comprising a base polymer comprising repeat units derived from a triple bond-containing maleimide compound is provided. A pattern with a high resolution and reduced edge roughness is formed therefrom."

The patent was filed on Feb. 4, 2022, under Application No. 17/592,711.

*For further information, including images, charts and table...