US Patent Issued to SHIN-ETSU CHEMICAL on April 15 for "Positive resist composition and pattern forming process" (Japanese Inventors)

ALEXANDRIA, Va., June 5 -- United States Patent no. 12,276,911, issued on April 15, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Positive resist composition and pattern forming process" was invented by Jun Hatakeyama (Joetsu, Japan), Masahiro Fukushima (Joetsu, Japan) and Naoki Ishibashi (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A positive resist composition comprises a base polymer comprising repeat units (a) derived from a triple bond-containing maleimide compound and repeat units (b) adapted to increase solubility in an alkaline developer under the action of acid. A pattern of good profile with a high resolution, reduced edge roughness, and reduced size variations is formed th...