US Patent Issued to SHIN-ETSU CHEMICAL on April 15 for "Onium salt, chemically amplified resist composition and patterning process" (Japanese Inventors)

ALEXANDRIA, Va., June 5 -- United States Patent no. 12,275,693, issued on April 15, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Onium salt, chemically amplified resist composition and patterning process" was invented by Masayoshi Sagehashi (Joetsu, Japan), Takayuki Fujiwara (Joetsu, Japan), Masahiro Fukushima (Joetsu, Japan), Masaki Ohashi (Joetsu, Japan) and Kazuhiro Katayama (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by lithography, the resist composition exhibits a high sensitivity, minimal LWR and improved CDU independent of whether it is of pos...