ALEXANDRIA, Va., July 16 -- United States Patent no. 12,360,052, issued on July 15, was assigned to SHIMADZU Corp. (Kyoto, Japan).
"Defect inspection apparatus and defect inspection method" was invented by Takahide Hatahori (Kyoto, Japan), Kenji Takubo (Kyoto, Japan) and Koki Yoshida (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A defect inspection apparatus (100) is configured to approximate a difference value or an absolute value (IAlpha) of the difference value between a pixel value in at least three captured images (A) captured by an imager in at least three different phases of an elastic wave and a pixel value in a reference image (Aave) separate from the captured images (A) so as to acqu...