ALEXANDRIA, Va., March 26 -- United States Patent no. 12,257,324, issued on March 25, was assigned to SHIMADZU Corp. (Kyoto, Japan) and NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Tokyo).
"Semiconductor SWCNT slurry for bioimaging and method for inspecting the same" was invented by Tsukasa Takeuchi (Kyoto, Japan), Toshiya Okazaki (Ibaraki, Japan), Yoko Iizumi (Ibaraki, Japan), Hiromichi Kataura (Ibaraki, Japan) and Masako Yudasaka (Ibaraki, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An object is to provide a method of inspection enabling a slurry of a batch resulting in abnormal accumulation to be identified in advance, and to provide an SWCNT slurry for bioimaging that has un...