US Patent Issued to SHIBAURA MECHATRONICS on Sept. 9 for "Processing liquid supply device, substrate processing apparatus, and method for inspecting processing liquid supply device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,412,756, issued on Sept. 9, was assigned to SHIBAURA MECHATRONICS Corp. (Kanagawa, Japan).

"Processing liquid supply device, substrate processing apparatus, and method for inspecting processing liquid supply device" was invented by Masaaki Furuya (Kanagawa, Japan), Hiroaki Kobayashi (Kanagawa, Japan) and Hideki Mori (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to one embodiment, a processing liquid supply device includes: a tank that stores the processing liquid; a supply path that supplies the processing liquid to the processing device; a heater that heats the processing liquid; a thermometer that measures a temperature of...