ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,472,534, issued on Nov. 18, was assigned to SHIBAURA MECHATRONICS Corp. (Kanagawa, Japan).
"Substrate processing apparatus" was invented by Kensuke Demura (Kanagawa, Japan), Satoshi Nakamura (Kanagawa, Japan), Masaya Kamiya (Kanagawa, Japan) and Minami Nakamura (Kanagawa, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "According to one embodiment, a substrate processing apparatus includes: a stage rotatable around a central axis; a plurality of holders provided on the stage to hold a substrate; a cooler capable of supplying a cooling gas to a space between the stage and the substrate; and a liquid supply capable of supplying a liquid to a surface o...