US Patent Issued to SHIBAURA MECHATRONICS on March 25 for "Processing liquid supply device, substrate processing apparatus, and processing liquid supply method" (Japanese Inventors)

ALEXANDRIA, Va., March 26 -- United States Patent no. 12,257,595, issued on March 25, was assigned to SHIBAURA MECHATRONICS Corp. (Kanagawa, Japan).

"Processing liquid supply device, substrate processing apparatus, and processing liquid supply method" was invented by Masaaki Furuya (Kanagawa, Japan), Hiroaki Kobayashi (Kanagawa, Japan) and Hideki Mori (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to one embodiment, a processing liquid supply device includes a plurality of tanks, a supply path that supplies a processing liquid to a processing device, a heating unit that heats the processing liquid, a dilution unit that dilutes the processing liquid, a new-liquid supply unit that su...