ALEXANDRIA, Va., June 4 -- United States Patent no. 12,318,803, issued on June 3, was assigned to SHIBAURA MECHATRONICS Corp. (Yokohama, Japan).
"Supply device and supply system" was invented by Masaaki Furuya (Yokohama, Japan), Hiroaki Kobayashi (Yokohama, Japan) and Hideki Mori (Yokohama, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A supply device includes a collect tank which collects a process liquid from a substrate processing device and heats the collected liquid, and a supply tank connected to the collect tank and which supplies, to the substrate processing device, the process liquid heated in the collect tank. The collect tank includes a collect container that stores the process liquid, a fi...