US Patent Issued to SHIBAURA MECHATRONICS on Feb. 11 for "Electromagnetic wave attenuator, electronic device, film formation apparatus, and film formation method" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 12 -- United States Patent no. 12,224,250, issued on Feb. 11, was assigned to SHIBAURA MECHATRONICS Corp. (Kanagawa, Japan).

"Electromagnetic wave attenuator, electronic device, film formation apparatus, and film formation method" was invented by Hisashi Nishigaki (Yokohama, Japan), Atsushi Fujita (Yokohama, Japan), Shohei Tanabe (Yokohama, Japan), Yoshinao Kamo (Yokohama, Japan) and Shigeki Matsunaka (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to one embodiment, an electromagnetic wave attenuator includes a first structure body. The first structure body includes a first member, a second member, and a third member. The first member includes a first magnetic...