ALEXANDRIA, Va., Feb. 19 -- United States Patent no. D1,062,256, issued on Feb. 18, was assigned to Shenzhen Yishila Technology Co. Ltd. (Shenzhen, China).
"Hat rack" was invented by Fangguo Jiang (Shenzhen, China).
The patent was filed on July 26, 2023, under Application No. D/898,308.
*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1062256&OS=D1062256&RS=D1062256
Disclaimer: Curated by HT Syndication....