US Patent Issued to SHENZHEN FEIYANG PROTECH on June 3 for "Hypoallergenic aspartic resin complex and preparation process thereof" (Chinese Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,319,638, issued on June 3, was assigned to SHENZHEN FEIYANG PROTECH CORP. LTD (Guangdong, China).

"Hypoallergenic aspartic resin complex and preparation process thereof" was invented by Rulong Zheng (Guangdong, China), Shuying Zheng (Guangdong, China), Ping Liang (Guangdong, China), Zhu Chen (Guangdong, China), Xiaoyong Qiu (Guangdong, China) and Junle Su (Guangdong, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application provides a hypoallergenic aspartic resin complex and a preparation process thereof and belongs to a technical field of aspartic resins. The hypoallergenic aspartic resin complex includes the following components: (A...