US Patent Issued to SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY on Dec. 9 for "Method of processing photoresist layer, method of manufacturing display panel, and display panel" (Chinese Inventor)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,495,712, issued on Dec. 9, was assigned to SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY Co. LTD. (Guangdong, China).

"Method of processing photoresist layer, method of manufacturing display panel, and display panel" was invented by Jianrong Chen (Shenzhen, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present application disclose a method of processing a photoresist layer, a method of manufacturing a display panel, and a display panel. By performing two exposure processes and one development process on a negative photoresist layer, an undercut structure can be obtained, effectively simplifying a process o...