ALEXANDRIA, Va., June 17 -- United States Patent no. 12,313,157, issued on May 27, was assigned to Shenzhen Bomit Technology Co. Ltd. (Shenzhen, China).
"Differential cover having diversion structure" was invented by Pan Ren (Guangdong, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided herein is a differential cover having a diversion structure. The differential cover includes a first surface, where the first surface of the differential cover is connected to a housing of the differential, the first surface is provided with an inwardly recessed accommodating cavity, and a longitudinally arranged middle diversion region is provided in the middle of the accommodating cavity; the accommodating cavity...