US Patent Issued to SHANGHAI INTEGRATED CIRCUIT MANUFACTURING INNOVATION CENTER on Nov. 4 for "Method and system for processing image" (Chinese Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,462,341, issued on Nov. 4, was assigned to SHANGHAI INTEGRATED CIRCUIT MANUFACTURING INNOVATION CENTER Co. LTD. (Shanghai).

"Method and system for processing image" was invented by Rui Yin (Shanghai), Min Xu (Shanghai), Wei Zhang (Shanghai) and Jian Jin (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a method and system for processing an image. The method comprises: acquiring high-frame data and low-frame data of a target object, and acquiring initial exposure time to complete the high-frame data and the low-frame data; calculating a proportion of overexposed pixel points and a proportion of underexposed pixel poin...