US Patent Issued to SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY CHINESE ACADEMY OF SCIENCES on Aug. 26 for "Micro-nano structure sensitive to laser beam in specific direction" (Chinese Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,399,318, issued on Aug. 26, was assigned to SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY CHINESE ACADEMY OF SCIENCES (Shanghai).

"Micro-nano structure sensitive to laser beam in specific direction" was invented by Haiyang Huang (Shanghai), Wei Li (Shanghai), Fengyuan Gan (Shanghai) and Yi Zhou (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a micro-nano structure sensitive to a laser beam in a specific direction, including a substrate, wherein an insulating layer is fixedly disposed on the substrate, the insulating layer is provided with two silicon nanowires parallel to each other and having the...