US Patent Issued to Shanghai Institute of Measurement and Testing Technology, Tongji University on June 17 for "Method for calibrating parameter error of electron probe microanalysis instrument" (Chinese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,332,195, issued on June 17, was assigned to Shanghai Institute of Measurement and Testing Technology (Shanghai) and Tongji University (Shanghai).

"Method for calibrating parameter error of electron probe microanalysis instrument" was invented by Lihua Lei (Shanghai), Chengming Cao (Shanghai), Yingfan Xiong (Shanghai), Zhangning Xie (Shanghai), Xiao Deng (Shanghai), Xinbin Cheng (Shanghai), Yuqing Guan (Shanghai), Wenzhe Zou (Shanghai) and Yunxia Fu (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application discloses a method for calibrating a parameter error of an electron probe microanalysis instrument. A one-dimensional grating s...