US Patent Issued to Shanghai Huali Microelectronics on May 20 for "Method for purge clean of low pressure furnace" (Chinese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,305,276, issued on May 20, was assigned to Shanghai Huali Microelectronics Corp. (China).

"Method for purge clean of low pressure furnace" was invented by Yuhong Lang (Shanghai) and Xinxing Tu (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application discloses a method for purge clean of a low pressure furnace, comprising: step 1, providing a process chamber of the low pressure furnace in a standby state, wherein an inner wall thin film formed by a furnace deposition process is accumulated on the surface of an inner wall of the process chamber; step 2, performing temperature ramp-up or temperature ramp-down treatment on the proces...