US Patent Issued to Shanghai Huali Microelectronics on Dec. 9 for "Method for manufacturing photomask and photomask" (Chinese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,236, issued on Dec. 9, was assigned to Shanghai Huali Microelectronics Corp. (Shanghai).

"Method for manufacturing photomask and photomask" was invented by Juan Liu (Shanghai) and Shirui Yu (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "The application discloses a method for manufacturing a photomask, firstly determining a main pattern area of a photomask substrate and an auxiliary pattern area around the main pattern area; performing optical intensity simulation on patterns of the main pattern area and the auxiliary pattern area by means of an optical proximity correction (OPC) model, so as to ensure that the pattern of the auxiliary patte...