US Patent Issued to Shanghai Huali Integrated Circuit on June 24 for "Wet clean apparatus for single wafer" (Chinese Inventor)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,341,029, issued on June 24, was assigned to Shanghai Huali Integrated Circuit Corp. (China).

"Wet clean apparatus for single wafer" was invented by Wenqian Xie (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present application discloses a wet clean apparatus for a single wafer, comprising: a baffle arranged on the periphery of the wafer bearing platform. The anti-splash structure comprises: a first vertical plate, wherein a length direction thereof is perpendicular to the surface of the wafer; a first opening transversely passing through the first vertical plate, wherein the first opening is arranged on a movement track of the etchant shak...