ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,664, issued on June 10, was assigned to Shanghai Huali Integrated Circuit Corp. (Shanghai).
"Dose mapper method" was invented by Shuo Liu (Shanghai).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present application discloses a dose mapper method, which includes: step 1: collecting critical dimension fingerprint of each tool and each mask and storing the critical dimension fingerprint in a database; step 2: before exposing a wafer, pre-selecting the tool and the mask to be used, selecting the corresponding critical dimension fingerprint from the database and combining the corresponding critical dimension fingerprint to form total critical dimensi...