US Patent Issued to SEOUL VIOSYS on Oct. 7 for "Wafer having auxiliary pattern for aligning light emitting device and method of fabricating unit pixel using the same" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,439,758, issued on Oct. 7, was assigned to SEOUL VIOSYS Co. LTD. (Ansan-si, South Korea).

"Wafer having auxiliary pattern for aligning light emitting device and method of fabricating unit pixel using the same" was invented by Namgoo Cha (Gyeonggi-do, South Korea), Seongchan Park (Gyeonggi-do, South Korea) and Jae Hee Lim (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer for fabricating a unit pixel is provided. The wafer includes a transparent substrate, and a light blocking layer disposed on the transparent substrate. The light blocking layer includes a plurality of unit pixel regions and at least one observation region. E...