US Patent Issued to Semiconductor Manufacturing International (Shanghai) on Dec. 9 for "Optical device and fabrication method thereof" (Chinese Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,152, issued on Dec. 9, was assigned to Semiconductor Manufacturing International (Shanghai) Corp. (Shanghai).

"Optical device and fabrication method thereof" was invented by Xiage Yin (Shanghai), Xia Feng (Shanghai), Xiaojun Chen (Shanghai), Dongsheng Zhang (Shanghai) and Jiaheng Wu (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "An optical device and its fabrication method are provided. The method includes: providing a substrate including a coupling region; forming a first dielectric layer on the substrate; forming an initial waveguide groove in the first dielectric layer on the coupling region; forming a patterned layer on a surface of the...