ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,438,029, issued on Oct. 7, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea).

"Variable capacitance device, substrate processing apparatus including the variable capacitance device, and substrate processing method" was invented by Jong Gun Lee (Chungcheongnam-do, South Korea) and Hyung Joon Kim (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus is provided. The substrate processing apparatus includes: a chuck member; a ceramic puck disposed on the chuck member; a focus ring disposed to surround the ceramic puck; an insulating layer disposed below the focus ring to surround the chuck mem...