ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,456,637, issued on Oct. 28, was assigned to Semes Co. Ltd. (Cheonan-si, South Korea).
"Substrate processing apparatus and substrate processing method" was invented by Youngjun Son (Cheonan-si, South Korea) and Taehoon Lee (Osan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a substrate supporter supporting a substrate, and a processing solution supply apparatus configured to supply a processing solution onto the substrate supported on the substrate supporter, wherein the processing solution supply apparatus includes a trap tank storing the processing solution, a supply line connected to the trap ...