ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,451,371, issued on Oct. 21, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea).
"Substrate processing apparatus and substrate processing method" was invented by Kang Sul Kim (Cheonan-si, South Korea), Tae-Keun Kim (Cheonan-si, South Korea), Junhee Choi (Cheonan-si, South Korea), Kyeong Min Lee (Cheonan-si, South Korea) and Yong Jun Kim (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a substrate processing apparatus that allow a chemical liquid to penetrate deeply into a gap between patterns of a substrate. The substrate processing apparatus includes a housing having a processing space defined therein in...