ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,443,108, issued on Oct. 14, was assigned to Semes Co. LTD. (Chungcheongnam-do, South Korea).
"Substrate treating apparatus" was invented by Ho Jin Jang (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a substrate treating apparatus. The substrate treating apparatus includes: a first process chamber having a first treatment space therein; a second process chamber having a second treatment space therein; and an exhaust unit exhausting atmospheres of the first treatment space and the second treatment space, in which the exhaust unit includes: an integrated exhaust line; a first exhaust line connecting t...