ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,576, issued on Oct. 14, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Apparatus and method for treating substrate" was invented by Jin Woo Choi (Gyeonggi-do, South Korea), Seung Jun Oh (Gyeonggi-do, South Korea), Jin Woo Nam (Chungcheongbuk-do, South Korea), Jang Hee Lee (Gyeonggi-do, South Korea), Young Hak Park (Chungcheongnam-do, South Korea) and Ahn Na Seo (Chungcheongnam-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate treating apparatus includes a process chamber having a reaction space with one or more insulation members exposed to the reaction space; a substrate support member supporting a substr...