ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,577, issued on Oct. 14, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea).
"Apparatus and method for processing substrate" was invented by Young Eun Jeon (Ulsan, South Korea), Yun Sang Kim (Gyeonggi-do, South Korea), Min Sung Jeon (Gyeonggi-do, South Korea), Ji Heon Kim (Gyeonggi-do, South Korea), Youngjo Jin (Gyeonggi-do, South Korea), Jin Hee Hong (Gyeonggi-do, South Korea), Sung Min Choi (Gyeonggi-do, South Korea) and Dong Young Jang (Gyeonggi-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing method capable of stably performing atomic layer etching without damaging a process chamber comprises prov...