US Patent Issued to SEMES on Nov. 4 for "Substrate processing apparatus and method using the plasma" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,015, issued on Nov. 4, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea).

"Substrate processing apparatus and method using the plasma" was invented by Dong Hun Kim (Seoul, South Korea), Da Som Bae (Seoul, South Korea), Wan Jae Park (Gyeonggi-do, South Korea), Seong Gil Lee (Gyeonggi-do, South Korea), Young Je Um (Busan, South Korea), Ji Hwan Lee (Incheon, South Korea), Dong Sub Oh (Busan, South Korea), Myoung Sub Noh (Gyeonggi-do, South Korea), Joun Taek Koo (Seoul, South Korea) and Du Ri Kim (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus and method capable of maximizing plasma unifor...