ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,119, issued on Nov. 18, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).
"Substrate processing apparatus and substrate processing method" was invented by Ki Sang Eum (Cheonan-si, South Korea), Dong Woon Park (Cheonan-si, South Korea), Young Jun Son (Cheonan-si, South Korea), Woo Ram Lee (Cheonan-si, South Korea) and Jin Ho Choi (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Proposed is a substrate processing apparatus for cleaning the bottom surface of a substrate. The apparatus includes a processing container configured to form a processing space for a substrate, a substrate support unit provided inside the process...