ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,472,739, issued on Nov. 18, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea).

"Droplet analysis unit and substrate treatment apparatus including the same" was invented by Won Yong Jin (Cheonan-si, South Korea) and Suk Won Jang (Cheonan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A droplet analysis unit capable of measuring and digitizing the meniscus shape, motion, and position of ink droplets and a substrate treatment apparatus including the droplet analysis unit are provided. The substrate treatment apparatus includes: a process treatment unit supporting a substrate while the substrate is being treated; an inkjet head...