US Patent Issued to SEMES on Nov. 11 for "Substrate processing apparatus control system and substrate processing apparatus control method" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,466,206, issued on Nov. 11, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).

"Substrate processing apparatus control system and substrate processing apparatus control method" was invented by Beomjeong Oh (Cheonan-si, South Korea) and Jong Nam Na (Yangju-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate processing apparatus control system and substrate processing apparatus control method, the substrate processing apparatus control system including an image generator for generating an image to be printed by a substrate processing apparatus including an inkjet head unit to print the image on a substrate in an i...