ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,465,956, issued on Nov. 11, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).
"Substrate processing apparatus and substrate processing method" was invented by Junhee Choi (Cheonan-si, South Korea), Tae-keun Kim (Cheonan-si, South Korea), Kang Sul Kim (Cheonan-si, South Korea), Kyeong Min Lee (Cheonan-si, South Korea) and Yong Jun Kim (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a substrate processing apparatus and a substrate processing method that allow a chemical liquid to penetrate deeply into a gap between patterns of a substrate. The substrate processing apparatus includes a chamber having a processi...