ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,719, issued on Nov. 11, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea).
"Substrate processing apparatus and method" was invented by Jae Yoon Shin (Chungcheongnam-do, South Korea) and Kee Woong Kim (Chungcheongnam-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus capable of minimizing process defects by controlling mist in a processing bath is provided. The substrate treating apparatus comprises a first processing bath and a second processing bath disposed adjacent to each other in a first direction, a first partition wall disposed between the first processing bath and the second processi...