ALEXANDRIA, Va., June 17 -- United States Patent no. 12,315,743, issued on May 27, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Substrate treating method and substrate treating apparatus" was invented by Ki Yung Lee (Suwon-si, South Korea) and Dongbock Lee (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The apparatus includes a chamber having a treating space for treating the substrate, a substrate support unit for supporting the substrate in the treating space, a gas supply unit for supplying gas into the treating space, and a plasma source for generating plasma from the gas supplied to the treating space, wherein the gas supply unit includes a shower head unit dis...