ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,470, issued on May 13, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).
"Substrate treating apparatus having edge impedance control circuit" was invented by Daehyun Kim (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate treating apparatus is disclosed. The apparatus includes a process chamber having a treating space defined therein, a support unit for supporting a substrate in the treating space, a gas supply unit for supplying process gas into the treating space, and an RF power source for supplying an RF signal to excite the process gas to a plasma state, wherein the support unit includes an edge ring surroundi...